AtomProtect mask

This mask eliminates 99.9% of virus, bacteria and fungus. It was created jointly by CONICET, UBA and UNSAM. The inner fabric layer incorporates silver ions and other fungicidal and bactericidal compounds, together with polymeric materials that enable retention of theses actives. The outer fabric layer is treated with a product that provides antiviral action, fungicidal and bactericidal compounds and polymers, so that its active features remain on the fabric, unaltered, after at least fifteen washes.